
NANOMETER CMOS
by Frank Schwierz (Technical University Ilmenau, Germany), Hei Wong (City University of Hong Kong, Hong Kong) & Juin J Liou (University of Central Florida, USA)
This book gives a comprehensive overview of all the important issues concerning modern Si MOSFETs. It covers the principles of MOSFET operation, theory, scaling issues, and an in-depth discussion of nanometer MOSFETs. Both classical nanometer MOSFETs as well as non-classical MOSFET concepts, which receive little coverage in textbooks, are treated in detail. The device structures, merits, and drawbacks of MOSFET concepts like strained Si MOSFETs, ultra-thin body SOI MOSFETs, and multiple gate MOSFETs (FinFETs, Tri-gate MOSFETs) are presented.
An entire chapter is devoted to the emerging and rapidly growing field of RF MOSFETs/RF CMOS, and the discussion extends to the important future trends in of nanometer CMOS technology and the problems and limits of scaling.
Contents:
- The Evolution of Silicon Electronics
- MOSFET Theory
- Nanoscale MOSFETs
- MOSFETs for RF Applications
- Overview of Nanometer CMOS Technology
- Outlook
Readership: Graduates and postgraduate students, researchers, engineers and managers in the fields of electrical & electronic engineering and nanoelectronics & microelectronics.
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"Nanoscale CMOS has become mainstream technology. This book deals with a very important topic and is written by two well-known contributors to the field. It is a very timely and important book."
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Prof Michael Shur Rensselaer Polytechnic Institute
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| "This book Nanometer CMOS combines the knowledge of three distinguished authors in a unique blend transcending from early history to modern day nanotechnology; the text will be both enjoyable, educational and illuminating for the technical novice to modern expert."
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Dr Steven Voldman IEEE Fellow ESD Association
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| 352pp |
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Jan 2010 |
| 978-981-4241-08-3 |
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US$155 |
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